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고온고압장비

진공 열처리 장비
| ALD: Atomic Layer Deposition system
DESCRIPTION
FEATURES
APPLICATIONS
SPECIFICATIONS
| Model No. | ALD-200 | ALD-500 |
| Description | Wafer sizexQ’ty : 4 inchx10Sht. | Wafer sizexQ’ty : 4 inchx15Sht. |
| Plasma Source. | RF = 1,000 W : 1 ea RF frequency : 13.56 MHz * Option Item | RF = 1,500 W : 1 ea RF frequency : 13.56 MHz * Option Item |
| Source Diameter | Φ 150 mm, Multi Stage | 200 mm, Multi Stage |
| Source hight | 122.0 mm | 122.0 mm |
| Degree of Angle | O Degree, Planar type | O Degree, Planar type |
| Type | Vertical & Upper Door open / close by pneumatic cylinder | Vertical & Upper Door open / close by pneumatic cylinder |
| Chamber size | Φ 200 x 95H in mm. | Φ 200 x 170H in mm. |
| Outer Case size | 1325L x 600W x 1298H | 1800L x 900W x 2033H |
| Construction Materials | SUS 304 | SUS 304 |
| Vacuum rate | 5 x 10E6 Torr. | 5 x 10E6 Torr. |
| Substrate Temp. | 300 ~ 5000℃ | 300 ~ 500℃ |
| Substrate Rotation | N / A(Not Applicable) | N / A(Not Applicable) |
| Z axis Adjust | N / A(Not Applicable) | N / A(Not Applicable) |
| Argon gas feed | 200 SCCM | 300 SCCM |
| Precursor Quantity | 4 ea with Heating Mantle | 4 ea with Heating Mantle |
| Carrier | Nitrogen, Oxygen, Hydrogen | Nitrogen, Oxygen, Hydrogen |
| Power Rating | 220 / 380 VAC, 3 Phase, 60 Hz, 45 kW | 220 / 380 VAC, 3 Phase, 60 Hz, 55 kW |
| PECVD : Plasma Enhanced Chemical Vapour Deposition System
DESCRIPTION
FEATURES
APPLICATIONS
SPECIFICATIONS
| Model No. | PECVD-014-8 | PECVD-018-10 |
| Description | Substrate size : 8 inch | Target size : 10 inch |
| Sputter Source. | RF = 1,000 W : 1 ea RF frequency : 13.56 MHz | RF = 1,500 W : 1 ea RF frequency : 13.56 MHz |
| Source Diameter | Φ 250 mm, Multi Stage | Φ 300 mm, Multi Stage |
| Source hight | 122.0 mm | 122.0 mm |
| Degree of Angle | O Degree, Planar type | 0 Degree, Planar type |
| Type | Vertical & Upper Door open / close by pneumatic cylinder | Vertical & Upper Door open / close by pneumatic cylinder |
| Chamber size | Φ 14 inch | Φ 18 inch |
| Construction Materials | SUS 304 | SUS 304 |
| Vacuum rate | 5 x 10E6 Torr. | 5 x 10E6 Torr. |
| Substrate Temp. | 300 ~ 8000℃ | 300 ~ 800℃ |
| Substrate Rotation | 10 ~ 40 mm | 0 ~ 20 rpm |
| Z axis Adjust | 200 SCCM | 10 ~ 50 mm |
| Argon gas feed | 200 SCCM | 300 SCCM |
| Power Rating | 220/380 VAC, 3 Phase, 60 Hz, 45 kW | 220/380 VAC, 3 Phase, 60 Hz, 55 kW |
| RF/DC Magnetron Sputtering System
Common Type
Planar Type
DESCRIPTION
FEATURES
APPLICATIONS
SPECIFICATIONS
· Common Type
| Model No. | RF/DC – C – 018 - 2 | RF/DC – C – 020 - 4 |
| Description | Target size : 2 inch | Target size : 4 inch |
| Sputter Source. | DC = 1,200 W : 1 ea RF = 800 W : 2 ea RF frequency : 13.56 MHz | DC = 1,500 W : 1 ea RF = 1,000 W : 2 ea RF frequency : 13.56 MHz |
| Source Diameter | Φ 88.9 mm | Φ 140.3 mm |
| Source hight | 122.0 mm | 122.0 mm |
| Degree of Angle | 120 Degree Dividing | 120 Degree Dividing |
| Magnet | Nd-Fe | Nd-Fe |
| Type | Vertical & Upper Door open / close by pneumatic cylinder | Vertical & Upper Door open / close by pneumatic cylinder |
| Chamber size | Φ 18 inch | Φ 20 inch |
| Construction Materials | SUS 304 | SUS 304 |
| Vacuum rate | 5 x 10E6 Torr. | 5 x 10E6 Torr. |
| Substrate Temp. | 300 ~ 1,000℃ | 300 ~ 1,000℃ |
| Substrate Rotation | 0 ~ 20 rpm | 0 ~ 20 rpm |
| Z axis Adjust | 10 ~ 40 mm | 10 ~ 50 mm |
| Argon gas feed | 100 SCCM | 150 SCCM |
| Power Rating | 220 / 380 VAC, 3 Phase, 60 Hz, 45 kW | 220 / 380 VAC, 3 Phase, 60 Hz, 55 kW |
· Planar Type
| Model No. | RF / DC-P-012 | RF / DC-P-014 | RF / DC-P-016 | RF / DC-P-016 |
| Description | Target Dia. 1“ | Target Dia. 2“ | Target Dia. 3“ | Target Dia. 4“ |
| Max. Thick. | 3.2 mm | 6.3 mm | 9.5 mm | 9.5 mm |
| Max. power | DC = 150 W RF = 150 W | DC = 700 W RF = 500 W | DC = 1,200 W RF = 800 W | DC = 1,500 W RF = 1,000 W |
| Argon gas Supply | 50 SCCM | 75 SCCM | 100 SCCM | 150 SCCM |
| Cooling W’tr | O.5 L/m | 1.7 L/m | 2.3 L/m | 3 L/m |
| Surce Dia. | 45.7 mm | 88.9 mm | 117.6 mm | 143.0 mm |
| Source Hight | 38.1 mm | 122.0 mm | 122.0 mm | 122.0 mm |
| Chamber size | Φ12 inch | Φ14 inch | Φ16 inch | Φ16 inch |
| Construction Materials | SUS 304 | SUS 304 | SUS 304 | SUS 304 |
| Type | Vertical, Upper door Pneumatic Cylinder ope / close | Vertical, Upper door Pneumatic Cylinder ope / close | Vertical, Upper door Pneumatic Cylinder ope / close | Vertical, Upper door Pneumatic Cylinder ope / close |
| Vacuum rate | 5 x 10E6 Torr. | 5 x 10E6 Torr. | 5 x 10E6 Torr. | 5 x 10E6 Torr. |
Substrate Temperature | 200 ~ 1,000 ℃ | 200 ~ 1,000 ℃ | 200 ~ 1,000℃ | 200 ~ 1,000℃ |
| Substrate Rotation | 0 ~ 20 rpm | 0 ~ 20 rpm | 0 ~ 20 rpm | 0 ~ 20 rpm |
| Z axis adjust | 10 ~ 30 mm | 10 ~ 40 mm | 10 ~ 50 mm | 10 ~ 50 mm |
| Power rating | 220 / 380 VAC, 3 P, 60 Hz, 25 kW | 220 / 380 VAC, 3 P, 60 Hz, 30 kW | 220 / 380 VAC, 3 P, 60 Hz, 35 kW | 220 / 380 VAC, 3 P, 60 Hz, 40 kW |
| Electron-beam Evaporation System
DESCRIPTION
FEATURES
APPLICATIONS
SPECIFICATIONS
| Model No. | EBE-016-211 | EBE-016-224 | EBE-016-264 | EBE-016-274 |
| Description | Single Pocket | 4cc x 4 Pocket | 7cc x 4 Pocket | 15cc x 4 Pocket |
| Chamber size | 16 inch | 16 inch | 16 inch | 16 inch |
| Construction Materials | SUS304 | SUS304 | SUS304 | SUS304 |
| Type | Vertical & Front Door | Vertical & Front Door | Vertical & Front Door | Vertical & Front Door |
| Vacuum rate | 5x10E6 Torr. | 5x10E6 Torr. | 5x10E6 Torr. | 5x10E6 Torr. |
| Substrate Temperature | 300~1000℃ | 300~1000℃ | 300~1000℃ | 300~1000℃ |
| Crucible Size | 15CC | 4CC | 4CC | 4CC |
| Substrate Rotation | 0~20rpm | 0~20rpm | 0~20rpm | 0~20rpm |
| E-beam Power | 6kW @ -6 ~ 10kV | 4kW @ -5 ~ -7kV | 10kW @ -6 ~ -10kV | 10kW @ -6 ~ -10kV |
| Power Ration | 220 / 380V AC, 3Phase, 60Hz 30kW | 220 / 380V AC, 3Phase, 60Hz 30kW | 220 / 380V AC, 3Phase, 60Hz 40kW | 220 / 380V AC, 3Phase, 60Hz 40kW |
엔에이티엠 Tel. 041.415.0402 Mail. ihkim@ntatm.com
본사 충청남도 천안시 서북구 입장면 연곡길 172-24 Tel : 041-415-0402 Fax : 0505-300-3853
연구소 인천광역시 연수구 갯벌로12(송도동) 한국희소금속산업기술센터 Tel : 070-4349-3853 Fax : 0505-300-3853
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